Reviewed Journals and Proceedings

  • Jan Thiesler et. al., “Novel nanopositioning system with improved range”, Proceedings of the 25th International Conference of the European Society for Precision Engineering and Nanotechnology 2025

Conferences

  • D. Leonard et al.,  THERMEC’25 30th June– 4th July 2025,  Topic: Smart/Intelligent Materials & Processes, keynote (oral) presentation
  • M. Ferrer et al.,- PERMolMat – 17th-19th March 2025 – Japan-France Workshop on Photo-Electro-Responsive Molecules and Materials, Topic: Comparison of PAGs for deep-UV green photoresists based on Chitosan, Poster
  • M. Ferrer et al., – Journées Annuelles SP2P’25 – Annual Meeting of the Photochemistry, Photophysics and Photosciences Subdivision (SP2P) May 19-21 2025, Topic: Comparison of PAGs for deep-UV green photoresists based on Chistosan, oral presentation
  • Gaoliang Dai et al., EUSPEN conference 9th – 13th June 2025, Topic: Novel hybrid interference and atomic force microscopy for in-situ reference areal surface metrology, Oral presentation
  • J. Thiesler et al., EUSPEN conference 9th – 13th  June 2025, Topic: Novel hybrid AI-PID controller, Poster
  • Gaoliang Dai et al., Taiwan‐GermanWorkshop on Optical Metrology conference, 05th March 2025, Topic: Overview of AFM-based techniques for accurate and traceable surface and nanodimensional metrology, Oral presentation
  • Gaoliang Dai et al., Technical Forum “Advanced Nanopositioningand Nanometrology for Precision Manufacturing and Processes” 06th March 2025, Topic: Hybrid nanopositioning system with improved range, dynamics and accuracy, Oral presentation
  • Gaoliang Dai et al., TSMC Precision Metrology Workshop 07th March 2025, Topic: A brief overview of reference nanometrology at PTB for supporting semiconductor industry, Oral presentation
  • Gaoliang Dai et al., Optical Technology and Measurement for Industrial Applications 2025 (OPTM2025) Conference 21th-25th April 2025, Topic: A novel hybrid interferometrical- and atomic force microscope, Oral presentation
  • Gaoliang Dai et al., 20th International Conference on Precision Engineering (ICPE2024) 23th-26th Oct 2024, Topic: A novel hybrid interferometrical- and atomic force microscope, Oral presentation
  • Gaoliang Dai et al., IMEKO 2024 26th-29th Aug 2024, Topic: Novel bottom-up traceability approach for calibrating geometries of tactile probes in dimensional metrology, Oral presentation
  • V. Constantoudis et al., NANOTEXNOLOGY 2025 08-10/07/2025, Topic: Machine learning approaches in materials characterization and soft matter molecular simulation: Challenges and Perspectives, Invited Talk
  • D. Leonard et al., Thermec 2025 conference June 30-July 4 2025, Topic: Formulation of chitosan-based resists for an optimized eco-efficient photolithography process: focus on the ToF-SIMS characterization, oral presentation
  • I. Servin et al., MCV25, Topic: LCA and SSbD approaches for more sustainable semiconductor industry, oral presentation
  • G. Markozanne et al., ISMC 2025, Topic: Synthesis and Characterization of Novel Polymeric Photoresists for Green Lithographic Processing, poster
  • A. Vasilakis et al., ISMC 2025, Topic: Development of novel environmentally-friendly photoresists for use in the semiconductor industry
  • J. Aigoin et al., END25 Topic: Développement de résines bio-sourcées de lithographie pour des applications microélectroniques, poster
  • C. Katsogridakis et al., Micro Nano &Chips tech 2025, Topic: Towards Environmentally- friendly Lithographic Processes with Sulfonium-based PAGs: Positive and Negative tone imaging in Chitosan films at 248nm, Poster
  • G. Papavieros et al., NN26, Topic: Hierarchical surfaces in nanotechnology and nanoelectronics, invited oral presentation
  • A. Stellas et al., NN26, Topic: AI-Driven Approaches for Advanced Nanometrology: From Scatterometry to Image-Based, oral presentation
  • G. Papavieros et al., SPIE 2026, Topic: Low-frequency Line Edge Roughness foreruns defects in line space patterns, Poster
  • A. Kondi et al., SPIE 2026, Topic: Reconstruction of 3D Line/Space pattern morphologies from top-down SEM images, Poster
  • A. Kondi et al., SPIE 2026, Topic: Diffusion models for defect detection in SEM images of contact hole patterns, Poster
  • A. Stellas et al., SPIE 2026, Topic: A hybrid physics-machine learning framework for fast, predictive low-pressure plasma etching models, Poster
  • A. Kondi et al., 41st Mask and Lithography Conference, Topic: Annotation-free defect detection in SEM images of contact holes using generative diffusion, Poster
  • A. Kondi et al., 41st Mask and Lithography Conference, Topic: Machine-Learning-based 3D reconstruction of line/space patterns from 2D SEM images: Denoising and AFM-based validation, Poster
  • J.-D. Isasa et al., SPIE 2026, Topic: Direct measurement of the acid generation and mobility in chemically-amplified photoresists through time and temperature dependent dielectric measurements
  • R. Dipti et al., EMRS 26, Topic: Chitosan based bio-sourced resists for near UV lithography: A Sustainable semiconductor manufacturing process, oral presentation
  • Y. Chevolot et al., EuroNanoLab 2026, Topic: Chitosan, a biosourced polysaccharide as an ecofriendly resist for lithography?, oral presentation
  • G. Markozanne et al., Bordeaux Polymer Conference (BPC 2026), Topic: Design of Water-Processable Chemically Amplified Photoresists for Green Lithographic Processing, oral presentation
  • A. Vasilakis et al., Bordeaux Polymer Conference (BPC 2026), Topic: Development of environmentally friendly negative tone photoresists, oral presentation
  • M. Ferrer et al., PHOTONANO’26 May 11-13, Topic: Increased efficiency of DUV photolithograpy of chitosan bioresist with new water-soluble PAGs, Oral presentation
  • M. Ferrer et al., MIRC 2026 September 29-30, Topic: Topic: Project Resing Green: Improving Chitosan Bioresist Sensitivity to DUV Photolithography for Microelectronics, Keynote (Oral) presentation
  • G. Markozanne et al., (T. Manouras), MNE2026, Topic: Novel positive-tone photoresists for sustainable 193 nm lithography, poster
  • C. Katsogridakis et al., MNE2026, Topic: Ammonium alginate photopatterning assisted by polyoxometalates towards a bio-sourced photoresist for 248 nm lithography, poster
  • R. Dipti et al., MNE2026, Topic: Novel bio-sourced resists for near-UV lithography towards environment friendly semiconductor manufacturing processes, poster
  • J. Aigoin et al., MNE2026, Topic: Chitosan-based resists toward sustainable DUV 248 nm photolithography, Poster
  • J. David Isasa et al., MNE2026, Topic: Future generation of green photoresists for high resolution electron beam and EUV lithography, Poster